ASTM F950-2002 用角抛光和疵点侵蚀加工法测量机械加工硅片表面晶体损坏深度的标准试验方法
ASTM F950-2002 标准详情
- 标准号：ASTM F950-2002
- 中文标题：用角抛光和疵点侵蚀加工法测量机械加工硅片表面晶体损坏深度的标准试验方法
- 英文标题：standard test method for measuring the depth of crystal damage of a mechanically worked silicon slice surface by angle polishing and defect etching
- 标准类别：美国材料与试验协会ASTM
- 发布日期：2002
内容简介
This standard was transferred to SEMI (www.semi.org) May 20031.1 This test method describes a technique to measure the depth of damage, on or beneath the surface of silicon wafers prior to any heat treatment of the wafer. Such damage results from mec
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