ASTM F518-1977(1991)E01 标准详情
- 标准号：ASTM F518-1977(1991)E01
- 中文标题：测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性的推荐规程
- 英文标题：practice for determining effective adhesion of photoresist to hard-surface photomask banks and semiconductor wafers during etching withdrawn 1996
- 标准类别：美国材料与试验协会ASTM
- 发布日期：1977
